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SiC components for high-temperature processes. / SiC 高溫製程零組件。

SEMICONDUCTOR HIGH-TEMPERATURE COMPONENTS

SiC components for high-temperature processes.

SiC wafer boats, boat paddles, furnace tubes and custom hot-zone components for oxidation, diffusion, annealing and CVD processes.

SiCHigh-temperature process material
5 groupsProduct range
CustomEquipment-interface review
01SiC PRODUCT RANGE

Five component groups for high-temperature processing.

Real product photographs distinguish vertical and horizontal wafer boats, paddles, furnace tubes and hot-zone support parts.

SiC vertical wafer boat / SiC 立式晶舟
01WAFER CARRIER

SiC vertical wafer boat

Supports batch wafer loading for oxidation, diffusion, annealing and deposition processes. Slot count, spacing and equipment interfaces are evaluated to the application.

SiC horizontal wafer boat / SiC 臥式晶舟
02WAFER CARRIER

SiC horizontal wafer boat

A horizontal carrier configuration for compatible furnace layouts. Geometry, loading direction and wafer-contact features are confirmed from drawings and equipment conditions.

SiC wafer-boat paddle / SiC 晶舟槳
03LOADING & TRANSFER

SiC wafer-boat paddle

Supports wafer-boat loading and transfer into high-temperature furnaces. Structure is evaluated around boat weight, span, interface and operating temperature.

SiC furnace tube / SiC 爐管
04HOT-ZONE COMPONENT

SiC furnace tube

Tube geometry, length, end structure and equipment connection are reviewed against temperature range, process atmosphere and furnace interfaces.

SiC hot-zone support parts / SiC 高溫區承載零組件
05FURNACE INTERFACE

SiC hot-zone support parts

Custom hot-zone supports and loading interfaces are developed around furnace geometry, process atmosphere, load direction and repeated thermal cycling.

02TECHNICAL BASIS

From product name to real process conditions.

01

Vertical wafer boats

One-piece SiC construction serves high-temperature vertical furnace processes. Base-material impurities are below 100 ppm, with optional CVD-SiC coating below 5 ppm; slot form, pitch and overall length are customized to the furnace interface.

02

Horizontal wafer boats

Designed for oxygen process gas, nitrogen protection and limited HCl near 1,250°C. One-piece forming and precision slot machining support repeated thermal cycling and wafer positioning.

03

Cantilever paddles

Engineering review focuses on span, load, connection geometry and high-temperature deformation. SiC base impurities are below 300 ppm, with optional CVD coating below 5 ppm.

04

Furnace tubes & hot-zone parts

Tube and hot-zone structures are developed around high-temperature oxidation, diffusion, annealing and CVD environments. Diameter, wall, end geometry, process atmosphere and equipment connection define the manufacturing route.

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