SiC MOTION-STAGE BEAMS
High-stiffness structures for fast precision motion.
Lightweighted silicon-carbide beams are developed for wafer stages and ultra-precision motion systems where inertia, rigidity and thermal stability must be managed together.
Motion-stage application
The verified application uses the beam to carry a wafer stage through high-speed, ultra-precision motion, making mass distribution and geometric stability key design inputs.
Lightweight structural design
Internal hollowing and application-specific rib layouts can reduce moving mass while retaining load paths, mounting zones and functional interfaces.
Material advantages
High stiffness, low thermal expansion, high density and wear resistance support repeatable geometry under acceleration and environmental temperature change.
Verified precision example
The technical specification records flatness and parallelism capability up to 1 μm for representative beam products. Final tolerances depend on size, datum scheme, machining route and inspection definition.
Information for evaluation
Please provide the 3D model and 2D drawing, travel direction, acceleration and load conditions, mounting datums, allowable mass, target geometry and operating temperature range.
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